Polarization sensitivity characterization under normal incidence of a multiple quantum wells saturable absorber nonlinear mirror as a function of the temperature of the chip

Optics Communications

Volumn 254, Issue 1-3, 2005, Pages 96-103

  Le Cren, Élodie ^a   Lobo, Sébastien ^b   Fève, Sylvain ^b   Simon, Jean Claude ^b  

^a UNIVERSITY OF AUCKLAND   (New Zealand)

^b UNIVERSITÉ DE RENNES 1   (France)

Author keywords

2R regenerator; Absorption dichroism; Contrast; Nonlinear mirror; Polarization dependent losses; Semiconductor saturable absorber in micro cavity

Indexed keywords

ANISOTROPY; FABRY-PEROT INTERFEROMETERS; INDIUM COMPOUNDS; LIGHT POLARIZATION; MIRRORS; SEMICONDUCTOR MATERIALS;

2R GENERATORS; ABSORPTION DICHROISM; CONTRAST; NONLINEAR MIRRORS (NLM); POLARIZATION DEPENDENT LOSSES; SEMICONDUCTOR SATURABLE ABSORBER IN MICRO-CAVITY;

SEMICONDUCTOR QUANTUM WELLS;

EID: 24644458212     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2005.05.024     Document Type: Article

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