Investigation of discrimination enhancement with new modeling for poly-hydroxystyrene positive resists

Journal of Photopolymer Science and Technology

Volumn 13, Issue 4, 2000, Pages 519-524

  Hatakeyama, Jun ^a   Nagura, Shigehiro ^a   Ishihara, Toshinobu ^a  

^a SHIN ETSU CHEMICAL CO LTD   (Japan)

Author keywords

Chemically amplified resist; Discrimination enhancement; Dissolution distribution; Poly hydroxystyrene

Indexed keywords

STYRENE DERIVATIVE;

ACID BASE BALANCE; ARTICLE; CHEMICAL REACTION; DISSOLUTION; MOLECULAR MODEL; REACTION ANALYSIS;

EID: 0034584721     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.13.519     Document Type: Article

References (12)

1. Computer simulation of exposure and development of a positive photoresist
2. Computer simulation of exposure and development of a positive photoresist