Asymmetry and thickness effects in reflective EUV masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 347-357

  Chen, Frederick T ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Antireflection layer; Extreme ultraviolet lithography; Image placement; Mask

Indexed keywords

ANTIREFLECTION COATINGS; COMPUTER SIMULATION; DIFFRACTION; FREQUENCY DOMAIN ANALYSIS; OPTICAL MULTILAYERS; PHOTOLITHOGRAPHY; SILICON WAFERS; THICKNESS MEASUREMENT;

ANTIREFLECTION LAYER; EXTREME ULTRAVIOLET LITHOGRAPHY; IMAGE PLACEMENT; REFLECTIVE MASK; THICKNESS EFFECTS;

MASKS;

EID: 0141501370     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483602     Document Type: Conference Paper

References (10)

1. P. Schiavone, G. Granet, and J. Y. Robic, "Rigorous electromagnetic simulation of EUV masks: influence of the absorber properties," Microelectronic Eng., 57-58, 497-503, 2001.
2. K. Otaki, "Asymmetric Properties of the Aerial Image in Extreme Ultraviolet Lithography," Jpn. J. Appl. Phys., 39, 6819-6826, 2000.
3. T. Liang, A. R. Stivers, P. Yan, E. Tejnil, G. Zhang, "Enhanced optical inspectability of patterned EUVL mask," 21st Annual BACUS Symposium on Photomask Technology, G. T. Dao and B. J. Grenon, vol. 4562, 288-296, SPIE, Bellingham, 2002.
4. J.R. Wasson, S.-I. Han, G. Edwards, P. J. Mangat, "Integration of antireflection coatings on EUV mask absorber stack," 22nd Annual BACUS Symposium on Photomask Technology, B. J. Grenon and K. R. Kimmel, vol. 4889, 382-388, SPIE, Bellingham, 2002.
5. F. Chen, "Polarizing Assist Features for High-NA Optical Lithography," 22nd Annual BACUS Symposium on Photomask Technology, B. J. Grenon and K. R. Kimmel, vol. 4889, 1313-1323, SPIE, Bellingham, 2002
6. K. Knop, "Rigorous diffraction theory for transmission phase gratings with deep rectangular grooves," J. Opt. Soc. Am. 68, pp.1206-1210, 1978.
7. M. Sugawara, M. Ito, T. Ogawa, E. Hoshino, A. Chiba, S. Okazaki, "Pattern Printability for Off-axis Incident Light in EUV Lithography," Emerging Lithographic Technologies VI, R. L. Engelstad, vol. 4668, 277-288, SPIE, Bellingham, 2002.
8. P-Y. Yan, "The Impact of EUVL Mask Buffer and Absorber Material Properties on Mask Quality and Performance," Emerging Lithographic Technologies VI, R. L. Engelstad, vol. 4668, 150-160, SPIE, Bellingham, 2002.
9. J. A. Dobrowolski, "Optical Properties of Films and Coatings," Handbook of Optics, M. Bass, vol. 1, pp. 42.25-34, McGraw-Hill, 1995.
10. E. Noponen and J. Turunen, "Eigenmode method for electromagnetic synthesis of diffractive elements with three-dimensional profiles," J. Opt. Soc. Am. A 11, pp.2494-2502, 1994.