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Volumn 5040 I, Issue , 2003, Pages 24-32

Size-dependent flare and its effect on imaging

Author keywords

Aerial image; Contrast; Flare; Length; Range; Scatter

Indexed keywords

ABERRATIONS; OPTICAL DESIGN; OPTICAL INSTRUMENT LENSES; OPTICAL SYSTEMS; OPTICAL TESTING;

EID: 0141499083     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485441     Document Type: Conference Paper
Times cited : (12)

References (7)
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    • Flagello, D.G.1    Pomerene, A.T.S.2
  • 2
    • 85076473652 scopus 로고
    • Scattered light in photolithographic lenses
    • Optical/Laser Microlithography VII, T.A. Brunner, ed.; SPIE
    • J. Kirk, "Scattered light in photolithographic lenses," Optical/Laser Microlithography VII, T.A. Brunner, ed., Proceedings of SPIE 2197, pp. 566 - 572, SPIE, 1994.
    • (1994) Proceedings of SPIE , vol.2197 , pp. 566-572
    • Kirk, J.1
  • 3
    • 0031364439 scopus 로고    scopus 로고
    • Measuring flare and its effect on process latitude
    • Optical Microlithography X, G.E. Fuller, ed.; SPIE
    • J. Park, H. Kang, J. Moon, and M. Lee, "Measuring flare and its effect on process latitude," Optical Microlithography X, G.E. Fuller, ed., Proceedings of SPIE 3051, p. 708 - 713, SPIE, 1997.
    • (1997) Proceedings of SPIE , vol.3051 , pp. 708-713
    • Park, J.1    Kang, H.2    Moon, J.3    Lee, M.4
  • 4
    • 0032632952 scopus 로고    scopus 로고
    • Flare impact on the intrafield CD control for sub-0.25μ patterning
    • Optical Microlithography XII, L. Van den Hove, ed.; SPIE
    • E. Luce et al., "Flare impact on the intrafield CD control for sub-0.25μ patterning," Optical Microlithography XII, L. Van den Hove, ed., Proceedings of SPIE 3679, p. 368 - 381, SPIE, 1999.
    • (1999) Proceedings of SPIE , vol.3679 , pp. 368-381
    • Luce, E.1
  • 5
    • 0035758507 scopus 로고    scopus 로고
    • Scattered light: The increasing problem for 193nm exposure tools and beyond
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    • K. Lai, C. Wu, and C. Progler, "Scattered light: the increasing problem for 193nm exposure tools and beyond," Optical Microlithography XIV, C. Progler, ed., Proceedings of SPIE 4346, p. 1424 - 1435, SPIE, 2001.
    • (2001) Proceedings of SPIE , vol.4346 , pp. 1424-1435
    • Lai, K.1    Wu, C.2    Progler, C.3
  • 7
    • 0035758414 scopus 로고    scopus 로고
    • Impact of flare on CD variation for 248nm and 193 nm lithography systems
    • Optical Microlithography XIV, C. Progler, ed.; SPIE
    • A. Bourov, L. Litt, and L. Zavyalova, "Impact of flare on CD variation for 248nm and 193 nm lithography systems," Optical Microlithography XIV, C. Progler, ed., Proceedings of SPIE 4346, p. 1388-1393, SPIE, 2001.
    • (2001) Proceedings of SPIE , vol.4346 , pp. 1388-1393
    • Bourov, A.1    Litt, L.2    Zavyalova, L.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.