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Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 589-593

Two-dimensional texture and sheath evolution in metal plasma immersion ion implantation

Author keywords

Homogeneity; MePIIID; Texture; TiN; XRD

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; DEPOSITION; ELECTRIC POTENTIAL; ION IMPLANTATION; PLASMA APPLICATIONS; PLASMA SHEATHS; TEXTURES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

EID: 24644440061     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.01.115     Document Type: Article
Times cited : (8)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.