Investigations on the influence of process parameters on the structural evolution of ion beam sputter deposited chromium thin films

Materials Science and Engineering: B

Volumn 123, Issue 1, 2005, Pages 7-12

  Balu, R ^a   Raju, A R ^b   Lakshminarayanan, V ^c   Mohan, S ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

^b JAWAHARLAL NEHRU CENTRE FOR ADVANCED SCIENTIFIC RESEARCH   (India)

^c RAMAN RESEARCH INSTITUTE   (India)

Author keywords

Chromium thin films; Ion Beam Sputter Deposition (IBSD); Oblique deposition

Indexed keywords

ADHESION; CHROMIUM; COBALT; ION BEAMS; MAGNETIC PROPERTIES; SPUTTER DEPOSITION;

CHROMIUM THIN FILMS; ION BEAM SPUTTER DEPOSITION (IBSD); OBLIQUE DEPOSITION; STRUCTURAL TRANSFORMATIONS;

MAGNETIC THIN FILMS;

EID: 24644435515     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2005.06.021     Document Type: Article

References (27)

1. J. Daval, and D. Randet IEEE Trans. Magn. MAG-6 1970 768 773
2. V. Agarwal, V.D. Vankar, and K.L. Chopra J. Vac. Sci. Technol. A 6 1988 2341 2343
3. N. Kuratani, A. Ebe, and K. Ogata J. Vac. Sci. Technol. A 16 1998 2489
4. A.K. Kulkarni, and L.C. Chang Thin Solid Films 301 1997 17 22
5. Y.C. Feng, D.E. Laughlin, and D.N. Lambeth J. Appl. Phys. 76 1994 7311 7316
6. R.A. Miller, and H.J. Holland Thin Solid Films 298 1997 182 186
7. T. Kawanabe, J. Park, and M. Naoe Mater. Sci. Eng. A 134 1991 1305 1308
8. Z.B. Zhao, S.M. Yalisove, Z.U. Rek, and J.C. Bilello J. Appl. Phys. 92 2002 7183 7192
9. Y. Gotoh, and Y. Taga J. Appl. Phys. 67 1990 1030 1036
10. D.D. Wang, and T. Oki J. Vac. Sci. Technol. A 8 1990 3163 3167
11. A. Ishikawa, K. Tanahashi, Y. Yahisa, Y. Hosoe, and Y. Shiroishi J. Appl. Phys. 75 1994 5978 5980
12. M. Shima, and C.A. Ross J. Appl. Phys. 93 2003 945 950
13. D.P. Ravipati, W.G. Haines, and J.L. Dockendorf J. Vac. Sci. Technol. A 5 1987 1968 1970
14. E.E. Fullerton, J.S. Jiang, C. Rehm, C.H. Sowers, S.D. Bader, J.B. Patel, and X.Z. Wu Appl. Phys. Lett. 71 1997 1579 1581
15. V. Guilbaud-Massereau, A. Celerier, and J. Machet Thin Solid Films 258 1995 185 193
16. C.V. Thompson, and R. Carel Mater. Sci. Eng. B 32 1995 211 219
17. M. Hu, S. Noda, and H. Komiyama J. Appl. Phys. 93 2003 9336 9344
18. M.A. Parker, K.E. Johnson, C. Hwang, and A. Bermea IEEE Trans. Magn. 27 1991 4730 4732
19. A. Van der Drift Philips Res. Rep. 22 1967 267 288
20. J.J. Cuomo S.M. Rossnagel H.R. Kaufman Handbook of Ion Beam Processing Technology 1989 Noyes Publications New Jersey
21. S. Balaji, P.V. Satyam, V. Lakshminarayanan, and S. Mohan Nucl. Instrum. Methods Phys. Res. B 217 2004 423 428
22. L. Abelmann, and C. Lodder Thin Solid Films 305 1997 1 21
23. T.G. Knorr, and R.W. Hoffman Phys. Rev. 113 1959 1039 1046
24. J.M. Nieuwenhuizen, and H.B. Haanstra Philips Tech. Rev. 27 1966 87 91
25. A.G. Dirks, and H.J. Leamy Thin Solid Films 47 1977 219 233
26. K. Robbie, J.C. Sit, and M.J. Brett J. Vac. Sci. Technol. B 16 1998 1115 1122
27. R. Messier, V.C. Venugopal, and P.D. Sunal J. Vac. Sci. Technol. A 18 2000 1538 1545