Field emission characteristics of boron nitride nanofilms deposited on substrate with various work functions

Diamond and Related Materials

Volumn 13, Issue 4-8, 2004, Pages 994-998

  Funakawa, Shingo ^a   Yamamuro, Yutaka ^a   Luo, Haitao ^a   Sugino, Takashi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Boron nitride; Field emission; Nanotechnology; Plasma CVD

Indexed keywords

ELECTRIC FIELDS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STAINLESS STEEL; SYNTHESIS (CHEMICAL); THIN FILMS;

FIELD EMISSIONS; POTENTIAL BARRIER HEIGHTS; STAINLESS STEEL MESH (SSM); WORK FUNCTIONS;

CUBIC BORON NITRIDE;

DIAMOND;

EID: 2442507745     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2004.01.033     Document Type: Article

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