Effect of oxygen plasma treatment on field emission characteristics of boron-nitride films

Applied Physics Letters

Volumn 74, Issue 6, 1999, Pages 889-891

  Sugino, Takashi ^a   Tagawa, Shigeru ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000077540     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123400     Document Type: Article

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