Surface oxide reduction and bilayer molecular assembly of a thiol-terminated organosilane on Cu

Applied Physics Letters

Volumn 87, Issue 1, 2005, Pages

  Ganesan, P G ^a   Kumar, A ^a   Ramanath, G ^a,b  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR ASSEMBLY; SULFONATE-TERMINATED SILANES; SURFACE OXIDE REDUCTIONS; THIOL;

ALCOHOLS; CHEMISORPTION; COPPER OXIDES; MONOLAYERS; ORGANOMETALLICS; REDUCTION; SILANES; SURFACE TREATMENT;

COPPER;

EID: 24144443515     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1968414     Document Type: Article

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