메뉴 건너뛰기




Volumn 49, Issue 8, 2005, Pages 1297-1301

Comparison study of ohmic contacts to 4H-silicon carbide in oxidizing ambient for harsh environment gas sensor applications

Author keywords

Gas sensor; LTLM structures; Ohmic contacts; Silicon carbide

Indexed keywords

AEROSPACE ENGINEERING; CARRIER COMMUNICATION; CHEMICAL SENSORS; OXIDATION; SILICON CARBIDE; TEMPERATURE CONTROL; TEMPERATURE MEASUREMENT;

EID: 24144437378     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2005.06.005     Document Type: Article
Times cited : (10)

References (14)
  • 1
    • 0031191172 scopus 로고    scopus 로고
    • Experimental and simulated results of SiC microwave power MESFETs
    • R.J. Trew Experimental and simulated results of SiC microwave power MESFETs Phys Status Solidi A162 1997 409 419
    • (1997) Phys Status Solidi , vol.162 , pp. 409-419
    • Trew, R.J.1
  • 2
    • 0033473756 scopus 로고    scopus 로고
    • Schottky diodes with thin catalytic gate materials for potential use as ammonia sensors for exhaust gases
    • L. Uneus, P. Tobias, P. Salomonsson, I. Lundstrom, and A. Lloyd Spetz Schottky diodes with thin catalytic gate materials for potential use as ammonia sensors for exhaust gases Sensor Mater 5 1999 305 318
    • (1999) Sensor Mater , vol.5 , pp. 305-318
    • Uneus, L.1    Tobias, P.2    Salomonsson, P.3    Lundstrom, I.4    Lloyd Spetz, A.5
  • 5
  • 6
    • 0029406301 scopus 로고
    • Critical review of ohmic and rectifying contacts for silicon carbide
    • L.M. Porter, and R.F. Davis Critical review of ohmic and rectifying contacts for silicon carbide Mater Sci Eng B34 1995 83 105
    • (1995) Mater Sci Eng , vol.34 , pp. 83-105
    • Porter, L.M.1    Davis, R.F.2
  • 7
    • 33645590688 scopus 로고    scopus 로고
    • CREE Research Inc., NC, USA
    • CREE Research Inc., NC, USA.
  • 9
    • 0036503593 scopus 로고    scopus 로고
    • Effect of interfacial reactions on electrical properties of Ni contacts on lightly doped n-type 4H-SiC
    • S.Y. Han, and J.L. LEE Effect of interfacial reactions on electrical properties of Ni contacts on lightly doped n-type 4H-SiC J Electrochem Soc 149 2002 G189 G193
    • (2002) J Electrochem Soc , vol.149
    • Han, S.Y.1    Lee, J.L.2
  • 10
    • 0036133201 scopus 로고    scopus 로고
    • Structural and electrical characterization of titanium and nickel silicide contacts on silicon carbide
    • F.L. Via, F. Roccaforte, A. Makhtari, V. Raineri, P. Musumeei, and L. Calcagno Structural and electrical characterization of titanium and nickel silicide contacts on silicon carbide Microelectron Eng 60 2002 269 282
    • (2002) Microelectron Eng , vol.60 , pp. 269-282
    • Via, F.L.1    Roccaforte, F.2    Makhtari, A.3    Raineri, V.4    Musumeei, P.5    Calcagno, L.6
  • 11
    • 0037087465 scopus 로고    scopus 로고
    • Thermal stability and performance reliability of Pt/Ti/WSi/Ni ohmic contacts to n-SiC for high temperature and pulsed power device applications
    • M.W. Cole, P.C. Joshi, C. Hubbard, J.D. Demaree, and M. Ervin Thermal stability and performance reliability of Pt/Ti/WSi/Ni ohmic contacts to n-SiC for high temperature and pulsed power device applications J Appl Phys 91 2002 3864 3868
    • (2002) J Appl Phys , vol.91 , pp. 3864-3868
    • Cole, M.W.1    Joshi, P.C.2    Hubbard, C.3    Demaree, J.D.4    Ervin, M.5
  • 12
    • 0036575162 scopus 로고    scopus 로고
    • Ohmic contact formation on inductively coupled plasma etched 4H-silicon carbide
    • S.K. Lee, S.M. Koo, C.M. Zetterling, and M. Ostling Ohmic contact formation on inductively coupled plasma etched 4H-silicon carbide J Electron Mater 31 2002 340 345
    • (2002) J Electron Mater , vol.31 , pp. 340-345
    • Lee, S.K.1    Koo, S.M.2    Zetterling, C.M.3    Ostling, M.4
  • 13
    • 0001672081 scopus 로고
    • Models for contacts to planar devices
    • H.H. Berger Models for contacts to planar devices Solid State Electron 15 1972 145 148
    • (1972) Solid State Electron , vol.15 , pp. 145-148
    • Berger, H.H.1
  • 14
    • 0036639286 scopus 로고    scopus 로고
    • Microscopic mapping of specific contact resistances and long-term reliability tests on 4H-silicon carbide using sputtered titanium tungsten contacts for high temperature device applications
    • S.K. Lee, C.M. Zetterling, and M. Ostling Microscopic mapping of specific contact resistances and long-term reliability tests on 4H-silicon carbide using sputtered titanium tungsten contacts for high temperature device applications J Appl Phys 92 2002 253 260
    • (2002) J Appl Phys , vol.92 , pp. 253-260
    • Lee, S.K.1    Zetterling, C.M.2    Ostling, M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.