First experiments of selected area nano-diffraction from semiconductor interfaces using a spherical aberration corrected TEM

Journal of Electron Microscopy

Volumn 54, Issue 2, 2005, Pages 123-126

  Yamasaki, Jun ^a   Sawada, Hidetaka ^b   Tanaka, Nobuo ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b JEOL LTD   (Japan)

Author keywords

Nano electron diffraction; Semiconductor interface; Spherical aberration correction; TEM

Indexed keywords

ABERRATIONS; ASPHERICS; ELECTRON DIFFRACTION; SILICON ALLOYS; SPHERES; TITANIUM ALLOYS;

ABERRATION CORRECTED TEM; LOCALISED; NANO-ELECTRON-DIFFRACTION; S CORRECTION; SELECTED AREA DIFFRACTION; SEMICONDUCTOR INTERFACES; SPHERICAL ABERRATION CORRECTION; SPHERICAL ABERRATIONS; TEM; TRANSMISSION ELECTRON;

TRANSMISSION ELECTRON MICROSCOPY;

EID: 23944457093     PISSN: 00220744     EISSN: None     Source Type: Journal    
DOI: 10.1093/jmicro/dfi028     Document Type: Article

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