Process optimization for dry etching of InP/InGaAsP-based photonic crystals with a Cl2/CH4/H2 mixture on an ICP-RIE

Conference Proceedings - International Conference on Indium Phosphide and Related Materials

Volumn , Issue , 2004, Pages 175-178

  Strasser, P ^a   Wuest R ^a   Robin, F ^a   Erni, D ^a   Jackel H ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; INDUCTIVELY COUPLED PLASMA; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING; REFRACTIVE INDEX; SEMICONDUCTING INDIUM PHOSPHIDE;

BEAM CURRENT; ION SCATTERING; LATTICE MATCHING; PHOTONIC CRYSTALS (PC);

CRYSTAL STRUCTURE;

EID: 23744458605     PISSN: 10928669     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)

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