Limitations of proximity-effect correction for electron-beam patterning of photonic crystals

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5277, Issue , 2004, Pages 186-197

  Wuest R ^a   Hunziker, C ^a   Robin, F ^a   Strasser, P ^a   Erni, D ^a   Jackel H ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

Electron Beam Lithography; Electron Beam Simulation; Energy Intensity Distribution; Hole Size Variation; Photonic Crystal; Proximity Effect Correction; Proximity Effect Parameter Measurement

Indexed keywords

BENCHMARKING; COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; ESTIMATION; LATTICE CONSTANTS; LIGHT MODULATION; PARAMETER ESTIMATION; PHOTONS; TIME DIVISION MULTIPLEXING; TOPOLOGY; WAVELENGTH DIVISION MULTIPLEXING;

ELECTRON-BEAM SIMULATION; ENERGY INTENSITY DISTRIBUTION; HOLE-SIZE VARIATION; PHOTONIC CRYSTALS; PROXIMITY-EFFECT CORRECTION; PROXIMITY-EFFECT PARAMETER-MEASUREMENT;

CRYSTALS;

EID: 18144441532     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.522316     Document Type: Conference Paper

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