Thin films of transition metal-containing molecule-based materials: A highlight on electrochemically processed systems

Coordination Chemistry Reviews

Volumn 249, Issue 17-18 SPEC. ISS., 2005, Pages 1986-1996

  Valade, Lydie ^a   De Caro, Dominique ^a   Basso Bert, Mario ^a   Malfant, Isabelle ^a   Faulmann, Christophe ^a   De Bonneval, Bénédicte Garreau ^a   Legros, Jean Pierre ^a  

^a LCC LABORATOIRE DE CHIMIE DE COORDINATION   (France)

Author keywords

Electrodeposition; Molecule based material; Silicon; Thin film; Transition metal

Indexed keywords

EID: 23644442746     PISSN: 00108545     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ccr.2005.03.030     Document Type: Conference Paper

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