Progress toward a high-brightness photoemission source for multiple-electron beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2581-2584

  Coyle, S T ^a   Fernandez, A ^a,b   Janaway, G ^a   Sagle, A ^a   Mankos, M ^a,c  

^a APPLIED MATERIALS INC   (United States)

^b Glimmerglass Networks   (United States)

^c KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CESIUM COMPOUNDS; CURRENT DENSITY; LASER BEAM EFFECTS; MASKS; PHOTOCATHODES; PHOTOEMISSION;

BRIGHTNESS; CESIUM TELLURIDE; MULTIPLE ELECTRON BEAM LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035519217     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1420202     Document Type: Article

References (8)

1. Some Au photocathodes were provided by S. Gosavi of Oregon Graduate Institute and L. Southall and W. Mackey of Linfield Research Institute.
2. 2Te photocathodes were provided by D. Nguyen of Los Alamos National Laboratory.
3. M. Mankos et al., J. Vac. Sci. Technol. B 18, 3010 (2000).
4. M. Mankos et al., J. Vac. Sci. Technol. B 19, 467 (2001).
5. G. A. Katrich and O. G. Sarbei, Sov. Phys. Solid State 3, 1181 (1961).
6. A. H. Sommer, Photoemissive Materials (Krieger, New York, 1980).
7. X. Jiang, C. N. Berglund, A. E. Bell, and W. A. Mackie, J. Vac. Sci. Technol. B 16, 3374 (1998).
8. S. H. Kone, J. Kinross-Wright, D. C. Nguyen, and R. L. Sheffield, J. Appl. Phys. 77, 1 (1995).