Prototype raster multibeam lithography tool

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2657-2661

  Coyle, S T ^a   Holmgren, D ^b   Chen, X ^b   Thomas, T ^c   Sagle, A ^a   Maldonado, J ^a   Shamoun, B ^a   Allen, P ^b   Gesley, M ^a  

^a APPLIED MATERIALS INC   (United States)

^b Applied Materials Company   (United States)

^c TKD Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; CURRENT DENSITY; ELECTRON BEAMS; ELECTRON EMISSION; IMAGE QUALITY; LASER BEAMS; LENSES; LIGHT MODULATION; MASKS; MIRRORS; OPTICAL DESIGN; PHOTOCATHODES;

ELECTRON BEAM PHOTOCATHODE COLUMN; ELECTRON BEAM PHOTOCATHODE GUN; ELECTRON ELECTRON INTERACTION; PHOTOCATHODE ILLUMINATION MODULE; PROTOTYPE RASTER MULTIBEAM LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0036874962     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1520574     Document Type: Article

References (3)

1. M. Mankos et al., J. Vac. Sci. Technol. B 18, 3010 (2000).
2. M. Mankos et al., J. Vac. Sci. Technol. B 19, 467 (2001).
3. S. T. Coyle et al., J. Vac. Sci. Technol. B 19, 2581 (2001).