The morphology of an InP wetting layer on GaAs

Applied Surface Science

Volumn 229, Issue 1-4, 2004, Pages 333-337

  Mattila, M ^a   Sopanen, M ^a   Lipsanen, H ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

Exchange reaction; GaAs; InP; Morphology

Indexed keywords

ATOMIC FORCE MICROSCOPY; DESORPTION; METALLORGANIC VAPOR PHASE EPITAXY; MONOLAYERS; MORPHOLOGY; PHOSPHORUS COMPOUNDS; SEMICONDUCTING INDIUM PHOSPHIDE; WETTING;

BAND STRUCTURES; EXCHANGE REACTIONS; WETTING LAYERS;

SEMICONDUCTING GALLIUM ARSENIDE;

EID: 2342632553     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.02.011     Document Type: Article

References (20)

1. Eaglesham D.J., Cerullo M., Phys. Rev. Lett. 64:1990;1943.
2. Moison J.M., Houzay F., Barthe F., Leprince L., André E., Vatel O., Appl. Phys. Lett. 64:1994;196.
3. J. Ahopelto, A.A. Yamaguchi, K. Nishi, A. Usui, H. Sakaki, Jpn. J. Appl. Phys. Part 2 32 (1993) L32.
4. van der Merwe J.H., Bauer E., Phys. Rev. B. 39:1989;3632.
5. Féron O., Nakano Y., Shimogaki Y., J. Cryst. Growth. 221:2000;129.
6. S. Sudo, Y. Nakano, M. Sugiyama, Y. Shimogaki, H. Komiyama, K. Tada, Thin Solid Films 313/314 (1998) 604.
7. Nittono T., Sugitani S., Hyuga F., J. Appl. Phys. 78:1995;5387.
8. Wada Y., Wada K., Appl. Phys. Lett. 63:1993;379.
9. Lipsanen H., Sopanen M., Taskinen M., Tulkki J., Ahopelto J., Appl. Phys. Lett. 68:1996;2216.
10. Berti M., Drigo A.V., Rossetto G., Torzo G., J. Vac. Sci. Technol. B. 15:1997;1794.
11. Sopanen M., Lipsanen H., Ahopelto J., Appl. Phys. Lett. 66:1995;2364.
12. Chiou S.W., Lee C.P., Hong J.M., Chen C.W., Tsou Y., J. Cryst. Growth. 206:1999;166.
13. Nakano T., Nakano Y., Shimogaki Y., J. Cryst. Growth. 221:2000;136.
14. Jönsson J., Reinhardt F., Zorn M., Ploska K., Richter W., Rumberg J., Appl. Phys. Lett. 64:1994;1998.
15. Sopanen M., Lipsanen H., Ahopelto J., Appl. Phys. Lett. 67:1995;3768.
16. M.E. Heimbuch, A.L. Holmes Jr., C.M. Reaves, M.P. Mack, S.P. DenBaars, L.A. Coldren, J. Electron. Mater. 23 (1994).
17. Reinhardt F., Dwir B., Biasiol G., Kapon E., Appl. Surf. Sci. 104/105:1996;529.
18. Wang Y.Q., Wang Z.L., Brown T., Brown A., May G., Thin Solid Films. 397:2001;162.
19. Xie Q., Nostrand J.E., Brown J.L., Stutz C.E., J. Appl. Phys. 86:1999;329.
20. Wang B., Zhao F., Peng Y., Jin Z., Li Y., Liu S., Appl. Phys. Lett. 72:1998;2433.