Two-photon microfabrication using two-component photoinitiation systems: Effect of photosensitizer and acceptor concentrations

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5211, Issue , 2003, Pages 112-123

  Leatherdale, C A ^a   DeVoe, R J ^a  

^a 3M COMPANY   (United States)

Author keywords

Microfabrication; Multiphoton; Polymerization; Two photon; Voxel

Indexed keywords

ACRYLICS; ASPECT RATIO; CRYSTAL STRUCTURE; LIGHT ABSORPTION; MONOMERS; OPTIMIZATION; PHOTOPOLYMERIZATION;

MICROFABRICATION; MULTIPHOTON; TWO-PHOTON; VOXELS;

PHOTOSENSITIZERS;

EID: 2342627959     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.508087     Document Type: Conference Paper

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