-
3
-
-
0004260764
-
-
ISO 11551. International Standard. International Organisation for Standardisation
-
ISO 11551(1997): Test method for absorptance of optical laser components. International Standard. International Organisation for Standardisation
-
(1997)
Test Method for Absorptance of Optical Laser Components
-
-
-
4
-
-
0042862968
-
DUV/VUV spectrophotometry for high precision spectral characterization
-
To be published in G.J. Exharos, A.H. Guenther, K.L. Lewis, M.J. Soileau, and C.J. Stolz, editors, Laser induced damage in optical materials
-
H. Blaschke, J. Kohlhaas, P. Kadkhoda, D. Ristau: DUV/VUV spectrophotometry for high precision spectral characterization: To be published in G.J. Exharos, A.H. Guenther, K.L. Lewis, M.J. Soileau, and C.J. Stolz, editors, Laser induced damage in optical materials. SPIE Vol. 4932, 2003
-
(2003)
SPIE
, vol.4932
-
-
Blaschke, H.1
Kohlhaas, J.2
Kadkhoda, P.3
Ristau, D.4
-
5
-
-
0034543780
-
Optical characterization of materials deposited by different processes; the LaF3 in the UV-visible region
-
Conference Optical and Infrared Thin Films
-
S. Bosch, N. Leinfellner, E. Quesnel, A. Duparré, J. Ferré-Borull, S. Günster, D. Ristau: Optical characterization of materials deposited by different processes; the LaF3 in the UV-visible region. Conference Optical and Infrared Thin Films, SPIE Vol. 4094, pp. 15-22, 2000
-
(2000)
SPIE
, vol.4094
, pp. 15-22
-
-
Bosch, S.1
Leinfellner, N.2
Quesnel, E.3
Duparré, A.4
Ferré-Borull, J.5
Günster, S.6
Ristau, D.7
-
6
-
-
0034538678
-
Spectrophotometric determination of absorption in the DUV/VUV spectral range for MgF2 and LaF3 thin films
-
Conference Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
-
S. Günster, D. Ristau, S. Bosch: Spectrophotometric determination of absorption in the DUV/VUV spectral range for MgF2 and LaF3 thin films Conference Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries Proceedings of SPIE Vol. 4099-35, 2000
-
(2000)
Proceedings of SPIE
, vol.4099
, Issue.35
-
-
Günster, S.1
Ristau, D.2
Bosch, S.3
-
8
-
-
0020848199
-
Photothermal displacement spectroscopy: An optical probe for solids and surfaces
-
M.A. Olmstead, N.M. Amer, and S. Kohn, D. Fournier, and A.C. Boccara: Photothermal displacement spectroscopy: An optical probe for solids and surfaces. Appl. Phys. A 32, 141-154, 1983
-
(1983)
Appl. Phys. A
, vol.32
, pp. 141-154
-
-
Olmstead, M.A.1
Amer, N.M.2
Kohn, S.3
Fournier, D.4
Boccara, A.C.5
-
9
-
-
51149205514
-
Thermo-optical spectroscopy: Detection by the "mirage effect
-
A.C. Boccora, D. Fournier, and J. Badoz: Thermo-optical spectroscopy: Detection by the "mirage effect", Appl. Phys. Lett. Vol.36, No.2, pp.130-132, 1980
-
(1980)
Appl. Phys. Lett.
, vol.36
, Issue.2
, pp. 130-132
-
-
Boccora, A.C.1
Fournier, D.2
Badoz, J.3
-
10
-
-
0003991663
-
-
Chap. 9, CRC Press, Boca Raton
-
R.E. Hummel and K.H. Günther (Eds): Thin Films for Optical Coatings, Vol.1 Optical Properties, Chap. 9, CRC Press, Boca Raton, 1995
-
(1995)
Thin Films for Optical Coatings, Vol.1 Optical Properties
, vol.1
-
-
Hummel, R.E.1
Günther, K.H.2
-
11
-
-
0036033566
-
Development of a photothermal deflection microscope for multiscale studies of defects
-
G.J. Exharos, A.H. Guenther, K.L. Lewis, M.J. Soileau, and C.J. Stolz, editors, Laser induced damage in optical materials
-
A. During, C. Fossati, and M. Commandré: Development of a photothermal deflection microscope for multiscale studies of defects. In G.J. Exharos, A.H. Guenther, K.L. Lewis, M.J. Soileau, and C.J. Stolz, editors, Laser induced damage in optical materials. SPIE Vol. 4679, pp.400-410, 2002
-
(2002)
SPIE
, vol.4679
, pp. 400-410
-
-
During, A.1
Fossati, C.2
Commandré, M.3
-
12
-
-
0036033415
-
Investigations of the dynamic absorptance behavior of hybrid multilayers at 193nm
-
G.J. Exharos, A.H. Guenther, K.L. Lewis, M.J. Soileau, and C.J. Stolz, editors, Laser induced damage in optical materials
-
H. Blaschke, M. Jupé, D. Ristau, S. Martin, S. Bock, and E. Welsch: Investigations of the dynamic absorptance behavior of hybrid multilayers at 193nm. In G.J. Exharos, A.H. Guenther, K.L. Lewis, M.J. Soileau, and C.J. Stolz, editors, Laser induced damage in optical materials. SPIE Vol. 4679, pp.420-428, 2002
-
(2002)
SPIE
, vol.4679
, pp. 420-428
-
-
Blaschke, H.1
Jupé, M.2
Ristau, D.3
Martin, S.4
Bock, S.5
Welsch, E.6
-
13
-
-
0042862973
-
Absorptance measurements for the DUV spectral range by laser calorimetry
-
To be published in G.J. Exharos, A.H. Guenther, K.L. Lewis, M.J. Soileau, and C.J. Stolz, editors, Laser induced damage in optical materials
-
H. Blaschke, M. Jupé, and D. Ristau: Absorptance measurements for the DUV spectral range by laser calorimetry. To be published in G.J. Exharos, A.H. Guenther, K.L. Lewis, M.J. Soileau, and C.J. Stolz, editors, Laser induced damage in optical materials. SPIE Vol. 4932, 2003
-
(2003)
SPIE
, vol.4932
-
-
Blaschke, H.1
Jupé, M.2
Ristau, D.3
-
14
-
-
0015630448
-
Development of a calorimetric method for making precision optical absorption measurements
-
D.A. Pinnow and T.C. Rich: Development of a calorimetric method for making precision optical absorption measurements. Appl. Opt. Vol.12, No.5, pp.984-992, 1973
-
(1973)
Appl. Opt.
, vol.12
, Issue.5
, pp. 984-992
-
-
Pinnow, D.A.1
Rich, T.C.2
-
15
-
-
0003304893
-
Nonlinear absorption phenomena in optical materials for the UV-spectral range
-
Proceedings of the International Workshop of Laser Beam and Optics Characterization
-
E. Eva and K.R. Mann: Nonlinear absorption phenomena in optical materials for the UV-spectral range, Proceedings of the International Workshop of Laser Beam and Optics Characterization. SPIE Bd. 2870, S.476-482, 1996
-
(1996)
SPIE
, vol.2870
, pp. 476-482
-
-
Eva, E.1
Mann, K.R.2
-
16
-
-
0036285061
-
Surface characterization techniques for determining rms roughness and power spectral densities of optical components
-
A. Duparré, J. Ferre-Borrull, S. Gliech, G. Notni, J. Steinert, and J. M. Bennett: Surface characterization techniques for determining rms roughness and power spectral densities of optical components. Appl. Opt. Vol. 41 (2002), no. 1, pp. 154-171
-
(2002)
Appl. Opt.
, vol.41
, Issue.1
, pp. 154-171
-
-
Duparré, A.1
Ferre-Borrull, J.2
Gliech, S.3
Notni, G.4
Steinert, J.5
Bennett, J.M.6
-
17
-
-
2342598179
-
Scatter Investigation of UV-Films: Facing the Trend Towards Shorter Wavelengths
-
Proceedings of "Optical Interference Coatings", Tucson
-
A. Duparré, and N. Kaiser: Scatter Investigation of UV-Films: Facing the Trend Towards Shorter Wavelengths. Proceedings of "Optical Interference Coatings", Tucson, OSA Technical Digest Series Vol.9, p.346-347, 1998.
-
(1998)
OSA Technical Digest Series
, vol.9
, pp. 346-347
-
-
Duparré, A.1
Kaiser, N.2
-
18
-
-
0034538622
-
Investigation on total scattering at 157 nm and 193 nm
-
Conference Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
-
P. Kadkhoda, H. Welling, S. Günster, D. Ristau: Investigation on total scattering at 157 nm and 193 nm. Conference Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, SPIE Vol. 4099, pp.65-74, 2000
-
(2000)
SPIE
, vol.4099
, pp. 65-74
-
-
Kadkhoda, P.1
Welling, H.2
Günster, S.3
Ristau, D.4
-
20
-
-
56249096802
-
3 - Fluoride multilayer coatings production
-
Proceedings of the Conference of on Optical Interference Coatings
-
3 - fluoride multilayer coatings production. Proceedings of the Conference of on Optical Interference Coatings, OSA Technical Digest pp. ME9-1 - ME9-3, 2001
-
(2001)
OSA Technical Digest
-
-
Günster, St.1
Kadkhoda, P.2
Ristau, D.3
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