Microstructure and composition of MgF2 optical coatings grown on Si substrate by PVD and IBS processes

Thin Solid Films

Volumn 360, Issue 1-2, 2000, Pages 133-138

  Jacob, D ^a   Peiro F ^a   Quesnel, E ^b   Ristau, D ^c  

^a EME   (Spain)

^b CEA LETI   (France)

^c LASER ZENTRUM HANNOVER E V   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; ION BEAMS; MAGNESIUM COMPOUNDS; MICROSTRUCTURE; MONOLAYERS; SEMICONDUCTING SILICON; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION; VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

COLUMNAR MICROSTRUCTURE; FLUORIDES; GRAZING ANGLE X RAY DIFFRACTION; ION BEAM SPUTTERING; MAGNESIUM FLUORIDE; PHYSICAL VAPOR DEPOSITION;

OPTICAL COATINGS;

EID: 0034141049     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00738-5     Document Type: Article

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