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Volumn 266, Issue 1-3, 2004, Pages 303-312

Modeling and simulation of AlN bulk sublimation growth systems

Author keywords

A1. Computer simulation; A1. Growth models; A2. Growth from vapor; A2. Single crystal growth; A3. Chemical vapor deposition processes; B1. Nitrides

Indexed keywords

ALUMINUM NITRIDE; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; SINGLE CRYSTALS; STRESS CONCENTRATION; SUBLIMATION; THERMAL STRESS;

EID: 2342474584     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.02.059     Document Type: Conference Paper
Times cited : (28)

References (17)
  • 14
    • 0002215675 scopus 로고    scopus 로고
    • Transport phenomena in chemical vapor-deposition systems
    • Academic Press, New York
    • R.L. Mahajan, Transport Phenomena in Chemical Vapor-Deposition Systems, Advanced in Heat Transfer, Vol. 28, Academic Press, New York, 1996, p. 339.
    • (1996) Advanced in Heat Transfer , vol.28 , pp. 339
    • Mahajan, R.L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.