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Volumn 266, Issue 1-3, 2004, Pages 303-312
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Modeling and simulation of AlN bulk sublimation growth systems
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Author keywords
A1. Computer simulation; A1. Growth models; A2. Growth from vapor; A2. Single crystal growth; A3. Chemical vapor deposition processes; B1. Nitrides
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Indexed keywords
ALUMINUM NITRIDE;
CHEMICAL VAPOR DEPOSITION;
COMPUTER SIMULATION;
SINGLE CRYSTALS;
STRESS CONCENTRATION;
SUBLIMATION;
THERMAL STRESS;
DEFECT DENSITY;
GROWTH FROM VAPOR;
GROWTH MODELS;
SINGLE CRYSTAL GROWTH;
CRYSTAL GROWTH;
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EID: 2342474584
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2004.02.059 Document Type: Conference Paper |
Times cited : (28)
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References (17)
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