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Volumn 9, Issue 4, 2000, Pages 309-312
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Microstructure of SiOx:H films prepared by plasma enhanced chemical vapor deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0034165576
PISSN: 10091963
EISSN: None
Source Type: Journal
DOI: 10.1088/1009-1963/9/4/011 Document Type: Article |
Times cited : (4)
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References (12)
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