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Volumn 74, Issue 1-4, 2002, Pages 393-400
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Substrate temperature and hydrogen dilution: Parameters for amorphous to microcrystalline phase transition in silicon thin films
a
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Author keywords
Amorphous silicon; Microcrystalline silicon; Phase transition; Plasma enhanced chemical vapor deposition; Raman spectroscopy
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Indexed keywords
AMORPHOUS SILICON;
CRYSTAL MICROSTRUCTURE;
CRYSTALLINE MATERIALS;
HIGH TEMPERATURE EFFECTS;
HYDROGEN;
PHASE TRANSITIONS;
PHOTOSENSITIVITY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
RAMAN SPECTROSCOPY;
SILANES;
SUBSTRATES;
TRANSMISSION ELECTRON MICROSCOPY;
MICROCRYSTALLINE SILICON;
THIN FILMS;
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EID: 0036778602
PISSN: 09270248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0927-0248(02)00126-5 Document Type: Article |
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Times cited : (10)
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References (4)
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