Influence of ion species ratio on grid-enhanced plasma source ion implantation

Chinese Physics

Volumn 13, Issue 1, 2004, Pages 65-70

  Wang, Jiu Li ^a   Zhang, Gu Ling ^a   Liu, Yuan Fu ^a   Wang, You Nian ^b   Liu, Chi Zi ^a   Yang, Si Ze ^a,b  

^a INSTITUTE OF PHYSICS   (China)

^b DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Grid enhanced plasma source ion implantation; Plasma sheath; Plasma simulation; Two ion fluid model

Indexed keywords

ELECTRODES; ION IMPLANTATION; MATHEMATICAL MODELS; NITROGEN; PLASMA SHEATHS; PLASMA SIMULATION; POSITIVE IONS; SURFACE PROPERTIES;

GRID-ENHANCED PLASMA SOURCE ION IMPLANTATION (GEPSII); IMPACT ENERGY; MOLECULAR IONS; TWO-ION FLUID MODELS;

PLASMA SOURCES;

EID: 23244438727     PISSN: 10091963     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-1963/13/1/013     Document Type: Article

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