SiO 2 deposition approaches using catalytic chemical-vapor deposition method

Journal of Applied Physics

Volumn 98, Issue 1, 2005, Pages

  Matsumoto, Yasuhiro ^a   Reyes, Mario A ^a   Escobosa, Arturo ^a  

^a DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

GAS FLOW; OPTICAL-BAND-GAP; SILICON OXIDE; THIN FILM DEPOSITION;

AMORPHOUS SILICON; CATALYSIS; CHEMICAL VAPOR DEPOSITION; DIFFUSION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXIDATION; REACTION KINETICS; STAINLESS STEEL; STOICHIOMETRY; THIN FILMS;

SILICA;

EID: 22944463803     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1954891     Document Type: Article

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