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Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 69, Issue , 2000, Pages 227-231

Application of Nd:YLF laser to amorphous silicon crystallization process

(6) Delli Veneri, P a Addonizio, M L a Imparato, A a Minarini, C a Privato, C a Terzini, E a

a ENEA CR Portici (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; CRYSTALLIZATION; DOPING (ADDITIVES); GRAIN SIZE AND SHAPE; IRRADIATION; NEODYMIUM LASERS; OPTICAL PUMPING; POLYCRYSTALLINE MATERIALS; Q SWITCHED LASERS; THIN FILM CIRCUITS;

FREQUENCY DOUBLED LASERS;

AMORPHOUS SILICON;

EID: 0033895066 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/S0921-5107(99)00300-1 Document Type: Article

Times cited : (4)

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