Supercritical carbon dioxide processing of fluorinated surfactant templated mesoporous silica thin films

Langmuir

Volumn 21, Issue 14, 2005, Pages 6145-6149

  Ghosh, Kaustav ^a   Lehmler, Hans Joachim ^b   Rankin, Stephen E ^a   Knutson, Barbara L ^a  

^a UNIVERSITY OF KENTUCKY   (United States)

^b UNIVERSITY OF IOWA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORINATED SURFACTANTS; PLURONIC SURFACTANTS; SILICA THIN FILMS; SUPERCRITICAL CARBON DIOXIDE;

ADSORPTION; CARBON DIOXIDE; CASTING; MESOPOROUS MATERIALS; SURFACE ACTIVE AGENTS; SYNTHESIS (CHEMICAL); THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

SILICA;

EID: 22444442768     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la050311t     Document Type: Article

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