Z-pinch discharge based EUV radiation source driven by a low inductance gap-less circuit

Conference Record of the International Power Modulator Symposium and High Voltage Workshop

Volumn , Issue , 2004, Pages 322-325

  Katsuki, Sunao ^a   Kimura, Akihiro ^a   Akiyoshi, Shinichi ^a   Fukumoto, Haruhiko ^a   Horita, Hiroyuki ^a   Namihira, Takao ^a   Akiyama, Hidenori ^a  

^a KUMAMOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; ELECTRIC GENERATORS; GAS DISCHARGE TUBES; INDUCTANCE; INERT GASES; LIGHT SOURCES; NETWORKS (CIRCUITS); PLASMA DEVICES; SPECTRUM ANALYSIS;

EXTREME ULTRAVIOLET (EUV); PLASMA DYNAMICS; PULSED CURRENT GENERATORS; RADIATION SOURCES;

ULTRAVIOLET RADIATION;

EID: 22244458940     PISSN: 10768467     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

1. V. Banine, J.P. Benschop, M. Leenders, R. Moors, "Relationship between EUV lithographic system," Proc. SPIE 3997, 126-135 (2000)
2. W.T. Silfvast, M.A. Klosner, "Xenon-emission spectra identification in the 5-20 nm spectral region in highly ionized xenon capillary-discharge plasmas," J. Opt. Soc. Am. B: Optical Physics, 17(7), 1279-1290 (2000)
3. M. McGeoch, "High-power extreme ultraviolet source based on a z-pinch," Appl. Optics 37, 1651-1658 (1998)
4. W.N. Partlo, I.V. Fomenkov, R. Oliver, D.L. Birx, "Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor," Proc. SPIE 3997, 136-156 (2000)
5. K. Bergman, G. Schriever, O. Rosier, M. Mueller, W. Neff, R. Lebert, "Highly repetitive extreme ultraviolet radiation source based on a gas-discharge plasma, Appl. Opt., 38, 5413-5417 (1999)
6. N. Bowering, M. Martins, W.N. Partlo, I.V. Fomenkov, "Extreme ultraviolet emission spectra of highly ionized xenon and their comparison of model calculations," J. Appl. Phys., 95(1), 16-23 (2004)