Radiation-induced electron traps in Al 0.14Ga 0.86N by 1 MeV electron radiation

Applied Physics Letters

Volumn 86, Issue 26, 2005, Pages 1-3

  Hogsed, Michael R ^a   Yeo, Yung Kee ^a   Ahoujja, Mo ^b   Ryu, Mee Yi ^c   Petrosky, James C ^a   Hengehold, Robert L ^a  

^a Air Force Institute of Technology   (United States)

^b UNIVERSITY OF DAYTON   (United States)

^c Kangwon National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON-BEAM EVAPORATION; PULSE WIDTH; RADIATION TOLERANCE; RADIATION-INDUCED ELECTRON TRAPS;

ACTIVATION ENERGY; CAPACITANCE; DEEP LEVEL TRANSIENT SPECTROSCOPY; ELECTRIC POTENTIAL; ELECTRON BEAMS; ELECTRON IRRADIATION; ELECTRON TRAPS; ELECTRONIC EQUIPMENT; GALLIUM NITRIDE; HALL EFFECT; MOLECULAR BEAM EPITAXY; OPTOELECTRONIC DEVICES;

ALUMINUM NITRIDE;

EID: 22144478680     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1977185     Document Type: Article

References (16)

1. A. P. Zhang, J. Han, F. Ren, K. E. Waldrip, C. R. Abernathy, B. Luo, G. Dang, J. W. Johnson, K. P. Lee, and S. J. Pearton, Electrochem. Solid-State Lett. 4, 39-G41 (2001).
2. D. Walker, V. Kumar, K. Mi, P. Sandvik, P. Kung, X. H. Zhang, and M. Razeghi, Appl. Phys. Lett. 76, 403 (2000).
3. A. T. Schremer, J. A. Smart, Y. Wang, O. Ambacher, N. C. MacDonald, and J. R. Shealy, Appl. Phys. Lett. 76, 736 (2000).
4. D. C. Look, D. C. Reynolds, J. W. Hemsky, J. R. Sizelove, R. L. Jones, and R. J. Molnar, Phys. Rev. Lett. 79, 2273 (1997).
5. D. C. Look, Z. Fang, and L. Polenta, Mater. Res. Soc. Symp. Proc. 595, W10.5.1 (2000).
6. K. H. Chow, G. D. Watkins, A. Usui, and M. Mizuta, Phys. Rev. Lett. 85, 2761 (2000).
7. K. Saarinen, T. Suski, I. Grzegory, and D. C. Look, Physica B 308, 77 (2001).
8. M. J. Legodi, S. S. Hullavarad, S. A. Goodman, M. Hayes, and F. D. Auret, Physica B 308, 1189 (2001).
9. D. C. Look and Z.-Q. Fang, Appl. Phys. Lett. 79, 84 (2001).
10. Z.-Q. Fang, D. C. Look, and L. Polenta, J. Phys.: Condens. Matter 14, 13061 (2002).
11. P. Omling, L. Samuelson, and H. G. Grimmeiss, J. Appl. Phys. 54, 5117 (1983).
12. F. D. Auret, S. A. Goodman, F. K. Koschnick, J.-M. Spaeth, B. Beaumont, and P. Gibart, Appl. Phys. Lett. 74, 407 (1999).
13. L. Polenta, Z.-Q. Fang, and D. C. Look, Appl. Phys. Lett. 76, 2086 (2000).
14. A. Castaldini, A. Cavallini, and L. Polenta, J. Phys.: Condens. Matter 12, 10161 (2000).
15. F. Gaudreau, P. Fournier, C. Carlone, S. M. Khanna, H. Tang, J. Webb, and A. Houdayer, IEEE Trans. Nucl. Sci. 49, 2702 (2002).
16. B. Luo, J. W. Johnson, R. Ren, K. K. Allums, C. R. Abernathy, S. J. Pearton, R. Dwivedi, T. N. Fogarty, R. Wilkins, A. M. Wowchack, C. J. Polley, P. P. Chow, and A. G. Baca. J. Electron. Mater. 31, 437 (2002).