Sputtered tungsten films on polyimide, an application for X-ray masks

Solid-State Electronics

Volumn 43, Issue 6, 1999, Pages 1075-1078

  Ligot, J ^a   Benayoun, S ^a   Hantzpergue, J J ^a   Remy, J C ^a  

^a ARTS ET MÉTIERS PARISTECH   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; GRAIN SIZE AND SHAPE; MASKS; POLYIMIDES; SPUTTERING; TUNGSTEN; X RAY DIFFRACTION ANALYSIS;

X RAY MASKS;

SEMICONDUCTING FILMS;

EID: 0032683882     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(99)00027-1     Document Type: Article

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