X-ray diffraction study of residual stresses and microstructure in tungsten thin films sputter deposited on polyimide

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 4, 2003, Pages 967-972

  Villain, P ^a   Goudeau, P ^a   Ligot, J ^b   Benayoun, S ^b   Badawi, K E ^a   Hantzpergue, J J ^b  

^a UNIVERSITÉ DE POITIERS   (France)

^b Arts et Metiers ParisTech   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; MECHANICAL PROPERTIES; PHASE COMPOSITION; PHASE TRANSITIONS; POLYIMIDES; RESIDUAL STRESSES; SPUTTER DEPOSITION; SUBSTRATES; THICK FILMS; THICKNESS MEASUREMENT; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

DEPOSITION PARAMETERS; TUNGSTEN THIN FILMS;

TUNGSTEN;

EID: 0041529690     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1578655     Document Type: Article

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