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Volumn 18, Issue 2, 2005, Pages 301-306

Micropattern formation of photosensitive imide block copolymer thick films

Author keywords

Imide block copolymer; Thick films and dissolution rate

Indexed keywords


EID: 22144446781     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.18.301     Document Type: Article
Times cited : (2)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.