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Volumn 18, Issue 2, 2005, Pages 301-306
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Micropattern formation of photosensitive imide block copolymer thick films
a a a a b a a b a |
Author keywords
Imide block copolymer; Thick films and dissolution rate
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Indexed keywords
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EID: 22144446781
PISSN: 09149244
EISSN: None
Source Type: Journal
DOI: 10.2494/photopolymer.18.301 Document Type: Article |
Times cited : (2)
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References (12)
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