Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999 (I), Issue , 2000, Pages 552-558

  Itatani, Taro ^a   Gorwadkar, Sucheta ^a   Fukushima, Takafumi ^a   Komuro, Masanori ^a   Itatani, Hiroshi ^a   Tomoi, Masao ^a   Sakamoto, Tsuenenori ^a   Matsumoto, Syunichi ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERIZATION; PHOTOSENSITIVITY; POLYIMIDES; SYNTHESIS (CHEMICAL);

ALIPATHIC RING; KRYPTON FLUORIDE;

PHOTORESISTS;

EID: 0033692327     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388339     Document Type: Conference Paper

References (3)