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Journal of Applied Physics

Volumn 97, Issue 12, 2005, Pages

Ductile relaxation in cracked metal-organic chemical-vapor-deposition-grown AlGaN films on GaN

(2) Bethoux, J M a Venngus P a

a CNRS (France)

Author keywords

[No Author keywords available]

Indexed keywords

DISLOCATION DENSITY; FILM THICKNESS; POSTGROWTH PROCESS; STRAIN RELAXATION;

ALUMINUM COMPOUNDS; CATHODOLUMINESCENCE; CRACKING (CHEMICAL); DUCTILITY; GALLIUM NITRIDE; GROWTH KINETICS; HIGH TEMPERATURE EFFECTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SAPPHIRE; STRAIN; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

RELAXATION PROCESSES;

EID: 21644487910 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1929856 Document Type: Article

Times cited : (21)

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