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Volumn 43, Issue 2 B, 2004, Pages
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Controlled Placement of Self-Organized Ge Dots on Patterned Si (001) Surfaces
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Author keywords
Dots; Electron beam lithography; Ge; Mesas; Self organized; Si; Ultra high vacuum chemical molecular epitaxy
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Indexed keywords
ALCOHOLS;
ATOMIC FORCE MICROSCOPY;
ELECTRON BEAM LITHOGRAPHY;
EPITAXIAL GROWTH;
QUANTUM THEORY;
SILICON;
SURFACE CHEMISTRY;
ULTRAHIGH VACUUM;
DOTS;
MESAS;
SELF-ORGANIZED;
ULTRA HIGH-VACUUM CHEMICAL MOLECULAR EPITAXY;
SEMICONDUCTING GERMANIUM;
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EID: 2142821491
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.43.l247 Document Type: Article |
Times cited : (1)
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References (17)
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