Photocatalytic TiO2 thin-films deposited by a pulsed laser deposition technique

Applied Surface Science

Volumn 169-170, Issue , 2001, Pages 535-538

  Terashima, Masahiro ^a   Inoue, Narumi ^a   Kashiwabara, Shigeru ^a   Fujimoto, Ryozo ^b  

^a NATIONAL DEFENSE ACADEMY   (Japan)

^b NIPPON BUNRI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FILM PREPARATION; NEODYMIUM LASERS; PHOTOCATALYSIS; PULSED LASER DEPOSITION; SILICON; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

ANATASE CRYSTALS;

OPTICAL FILMS;

EID: 0035127454     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00715-7     Document Type: Article

References (8)

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