Micromachining of p-type 6H-SiC by electrochemical etching

Sensors and Actuators, A: Physical

Volumn 112, Issue 1, 2004, Pages 36-43

  Chang, Wei Hsu ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Electrochemical etching; MEMS; Micromachining; p Type 6H SiC

Indexed keywords

CURRENT DENSITY; ELECTROCHEMISTRY; ELECTROLYTIC POLISHING; ETCHING; MAGNETOPLASMA; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MORPHOLOGY; OPTIMIZATION; OXIDATION; PASSIVATION; SINGLE CRYSTALS; SURFACE ROUGHNESS; TOUGHNESS;

ANODIC ETCHING; ELECTROCHEMICAL ETCHING; MEMS; P-TYPE 6H-SIC;

SILICON CARBIDE;

EID: 2142654981     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2003.09.046     Document Type: Article

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