Direct spray coating of photoresist for MEMS applications

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4557, Issue , 2001, Pages 312-319

  Pham, Nga P ^a   Scholtes, Tom L M ^a   Klerk, Ruud ^a   Wieder, B ^b   Sarro, Pasqualina M ^a   Burghartz, Joachim N ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b EVGroup ^*  (Austria)

Author keywords

Lithography for MEMS; Micromachining; Resist spray coating; RF MEMS

Indexed keywords

DEPOSITION; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; SPRAYED COATINGS;

RESIST SPRAY COATINGS;

PHOTORESISTS;

EID: 0035768057     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.442960     Document Type: Article

References (9)

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2. S. Linder, H. Baltes, F. Gnaedinger, E. Doering, S. Linder et al., "Fabrication technology for Wafer Through-Hole Interconnections and Three-Dimensional Stacks of Chips and Wafers", IEEE Proc. of MEMS 1994, pp. 349-354.
3. Electronic Vision at: http://www.EVGroup.com.
4. "AZA823 Photoresist", Technical information, Clarian Corp.
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8. th MEL-ARI/NID Workshop, July 2001, Wurzburg, Germany.
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