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Applied Surface Science

Volumn 249, Issue 1-4, 2005, Pages 45-53

Excimer laser modification of thin AlN films

(7) Georgiev, D G a Rosenberger, L W a Danylyuk, Y V a Baird, R J a Newaz, G a Shreve, G a Auner, G a

a Wayne State University (United States)

Author keywords

Aluminum nitride; Excimer laser; Plasma source molecular beam epitaxy

Indexed keywords

ACOUSTIC SURFACE WAVE DEVICES; ALUMINUM NITRIDE; CHEMICAL MODIFICATION; EXCIMER LASERS; MICROELECTRONICS; MOLECULAR BEAM EPITAXY; PLASMA APPLICATIONS; THERMAL CONDUCTIVITY; THERMAL EXPANSION;

FILM SURFACES; LASER FLUENCES; OPTICAL SPECTROPHOTOMETRY; PLASMA-SOURCE MOLECULAR BEAM EPITAXY;

THIN FILMS;

EID: 21244449553 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2004.11.027 Document Type: Article

Times cited : (15)

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