Fast and rigorous three-dimensional mask diffraction simulation using battle-lemarie wavelet based multiresolution time-domain method

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 I, Issue , 2003, Pages 69-77

  Yeung, Michael S ^a  

^a BOSTON UNIVERSITY   (United States)

Author keywords

Lithography simulation; Multiresolution time domain method; Phase shifting masks

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; FINITE DIFFERENCE METHOD; NYQUIST DIAGRAMS; PHOTOLITHOGRAPHY; TIME DOMAIN ANALYSIS;

BATTLE-LEMARIE WAVELET BASED MULTIRESOLUTION TIME-DOMAIN METHOD; NYQUIST LIMIT; PHASE-SHIFTING MASK; THREE-DIMENSIONAL MASK DIFFRACTION SIMULATION;

MASKS;

EID: 0141833847     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485433     Document Type: Conference Paper

References (4)

1. M. Krumpholz and L. P. B. Katehi, "MRTD: New Time Domain Schemes Based on Multiresolution Analysis", IEEE Trans. Microwave Theory Tech., vol. 44, pp. 555-561 (1996)
2. A. Taflove, "Advances in Computational Electrodynamics: the Finite-Difference Time-Domain Method" (Artech House, Boston, 1998)
3. G. Battle, "A Block Spin Construction of Ondelettes - Part I: Lemarie Functions", Commun. Math. Phys., vol. 110, pp. 601-615 (1987)
4. P. G. Lemarie, "Ondelettes a Localization Exponentielles", J. Math. Pures Appl., vol. 67, pp. 227-236 (1998)