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Journal of Solid State Electrochemistry

Volumn 9, Issue 5, 2005, Pages 398-402

A preliminary study on chemical micro-machining of complex three-dimensional patterns on silicon substrates

(7) Shi, Kang a Tang, Jing a Zhang, Li a Zhou, Yong Liang a Qu, Dong Sheng b Sun, Li Ning b Tian, Zhong Qun a

a XIAMEN UNIVERSITY (China)

b HARBIN INSTITUTE OF TECHNOLOGY (China)

Author keywords

Confined etchant layer technique; Cysteine; Etching; Micro machining; Silicon

Indexed keywords

ELECTRIC POTENTIAL; ELECTROCHEMICAL CORROSION; ETCHING; LITHOGRAPHY; MICROMACHINING; MICROSTRUCTURE; OXIDATION; SUBSTRATES;

CONFINED ETCHANT LAYER TECHNIQUE; CYSTEINE SILICON; SILICON ETCHED SYSTEM; SILICON SUBSTRATES;

SILICON;

EID: 21144441048 PISSN: 14328488 EISSN: None Source Type: Journal
DOI: 10.1007/s10008-004-0636-4 Document Type: Article

Times cited : (15)

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