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Volumn 43, Issue 12-13, 1998, Pages 1683-1690

Studies on silicon etching using the confined etchant layer technique

Author keywords

Confined etchant layer technique (CELT); Etching; High resolution; Scanning electrochemical microscopy (SECM); Silicon

Indexed keywords

BROMINE; ELECTROCHEMICAL ELECTRODES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SOLUTIONS; SURFACE PHENOMENA;

EID: 0032310703     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(97)00301-0     Document Type: Article
Times cited : (50)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.