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Volumn 43, Issue 12-13, 1998, Pages 1683-1690
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Studies on silicon etching using the confined etchant layer technique
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Author keywords
Confined etchant layer technique (CELT); Etching; High resolution; Scanning electrochemical microscopy (SECM); Silicon
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Indexed keywords
BROMINE;
ELECTROCHEMICAL ELECTRODES;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON;
SOLUTIONS;
SURFACE PHENOMENA;
CONFINED ETCHANT LAYER TECHNIQUE;
ELECTROGENERATED BROMINE;
SCANNING ELECTROCHEMICAL MICROSCOPY;
ETCHING;
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EID: 0032310703
PISSN: 00134686
EISSN: None
Source Type: Journal
DOI: 10.1016/S0013-4686(97)00301-0 Document Type: Article |
Times cited : (50)
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References (15)
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