Kinetic scanning tunneling microscopy study of iron silicide growth on Si(113)

Surface Science

Volumn 454, Issue 1, 2000, Pages 802-806

  Kneppe, M ^a   Dorna, V ^a   Kohstall, P ^a   Kot, E ^a   Kohler U ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; EPITAXIAL GROWTH; INTERDIFFUSION (SOLIDS); LOW ENERGY ELECTRON DIFFRACTION; MONOLAYERS; MORPHOLOGY; PROBABILITY; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; STOICHIOMETRY; THIN FILMS;

IRON SILICIDE;

IRON COMPOUNDS;

EID: 0033721505     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(00)00275-2     Document Type: Article

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