SCOPUS 정보 검색 플랫폼

Volumn 17, Issue 11, 2005, Pages 1398-1401

Chemical nanopatterns via nanoimprint lithography for simultaneous control over azimuthal and polar alignment of liquid crystals

(5) Park, Sunggook a,c Padeste, Celestino a Schift, Helmut a Gobrecht, Jens a Scharf, Toralf b

a PAUL SCHERRER INSTITUTE (Switzerland)

b Institute of Microtechnology (Switzerland)

c Louisiana State University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; GLASS TRANSITION; LITHOGRAPHY; MOLECULAR ORIENTATION; NANOSTRUCTURED MATERIALS; PLASTICITY; POINT DEFECTS; POLARIZATION; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING; SILICA;

CHEMICAL PATTERNS; MICROTEXTURE; NANOIMPRINT LITHOGRAPHY; PLANAR TEXTURES;

NEMATIC LIQUID CRYSTALS;

EID: 20444435944 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/adma.200400989 Document Type: Article

Times cited : (75)

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