Vapor phase decomposition-droplet collection-total reflection X-ray fluorescence spectrometry for metallic contamination analysis on Ge wafers

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 60, Issue 2, 2005, Pages 209-213

  Hellin, D ^a,b   Geens, V ^c   Teerlinck, I ^a   Van Steenbergen, J ^a   Rip, J ^a   Laureyn, W ^a   Raskin, G ^d   Mertens, P W ^a   De Gendt, S ^a,b   Vinckier, C ^b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c Industriele Hogeschool GROEP T   (Belgium)

^d UMICORE   (Belgium)

Author keywords

Ge wafer; Metallic contamination; TXRF matrix effects; Vapor phase decomposition droplet collection

Indexed keywords

CONTACT ANGLE; CRYSTAL IMPURITIES; CRYSTAL ORIENTATION; DECOMPOSITION; HYDROCHLORIC ACID; INTEGRATED CIRCUITS; OLIGOMERS; OPTIMIZATION; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICES; SOLUTIONS; SPECTROMETRY; SPIN COATING; SUBSTRATES; X RAY SPECTROSCOPY;

GE WAFERS; METALLIC CONTAMINATION; TXRF MATRIX EFFECTS; VAPOR PHASE DECOMPOSITION-DROPLET COLLECTION (VPD-DC);

SILICON WAFERS;

EID: 20044378277     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sab.2004.10.013     Document Type: Article

References (11)

1. C.O. Chui, S. Ramanathan, B.B. Triplett, P.C. McIntyre, and K.C. Saraswat Germanium MOS capacitors incorporating ultrathin high-k gate dielectric IEEE Electron Device Lett. 23 2002 473 475
2. The International Technology Roadmap for Semiconductors, Semiconductor Industry Association, Edition 2003, Metrology p 4-5, see also http://public.itrs.net/ for the most recent updates.
3. D. Hellin, T. Bearda, C. Zhao, G. Raskin, P.W. Mertens, S. De Gendt, M.M. Heyns, and C. Vinckier Determination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch-total reflection X-ray fluorescence spectrometry Spectrochim. Acta Part B 58 2003 2093 2104
4. S. Pahlke, L. Fabry, L. Kotz, C. Mantler, and T. Ehmann Determination of ultra trace contaminants on silicon wafer surfaces using total-reflection X-ray fluorescence TXRF 'state of the art' Spectrochim. Acta Part B 56 2001 2261 2274
5. D. Hellin, J. Rip, S. Arnauts, S. De Gendt, P.W. Mertens, and C. Vinckier Validation of vapor phase decomposition-droplet collection-total-reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers Spectrochim. Acta Part B 59 2004 1149 1158
6. M. Hourai, T. Naridomi, Y. Oka, K. Murakami, S. Sumita, N. Fujino, and T. Shiraiwa A method of quantitative contamination with metallic impurities of the surface of a silicon wafer Jpn. J. Appl. Phys. 27 1988 2361 2363
7. S. De Gendt, A. Huber, B. Onsia, S. Arnauts, K. Kenis, D.M. Knotter, P.W. Mertens, and M.M. Heyns Vapor phase decomposition-droplet collection: can we improve the collection efficiency for copper contamination? M.M Heyns P.W. Mertens M. Meuris UCPSS Conference Proceedings 1998 Diffusion and Defect Data. Part B, Solid State Phenomena vol. 65-66 1999 Scitec Publications Switzerland 93 96
8. D. Hellin, W. Fyen, J. Rip, T. Delande, P.W. Mertens, S. De Gendt, and C. Vinckier Saturation effects in total reflection-X-ray fluorescence spectrometry on micro-droplet residue samples J. Anal. At. Spectrom. 19 2004 1517 1523
9. U. Reus Total-reflection X-ray fluorescence spectrometry-matrix removal procedures for trace analysis in high-purity silicon, quartz and sulfuric acid Spectrochim. Acta Part B 44 1989 533 541
10. Y. Yamada, S. Kozuka, A. Shimazaka, and M. Takenaka, Diffusion and Defect Data. Part B, Solid State Phenomena, Evaluation of ultratrace metallic elements in poly-SiGe thin films M. Heyns P. Mertens M. Meuris UCPSS Conference Proceedings 2002 Diffusion and Defect Data. Part B, Solid State Phenomena vol. 92 2003 97 100
11. F. Glocking The Chemistry of Germanium 1969 Academic Press London