Plasma sources for high-rate etching of SiC

Solid State Technology

Volumn 48, Issue 5, 2005, Pages 61-64

  Robb, Kenneth M ^a   Hopkins, J ^a   Nicholls, G ^a   Lea, L ^a  

^a Surface Technology Systems Plc   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING; CHEMICAL RESISTANCE; INDUCTIVELY COUPLED PLASMA; MICROELECTROMECHANICAL DEVICES; PLASMA ETCHING; PLASMA SOURCES; SILICON WAFERS;

BANDGAP; BOND ENERGY; HIGH-RATE ETCHING; MULTIPOLAR MAGNETIC CONFINEMENT;

SILICON CARBIDE;

EID: 19644395629     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Review

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