Recursive least squares estimation for run-to-run control with metrology delay and its application to STI etch process

IEEE Transactions on Semiconductor Manufacturing

Volumn 18, Issue 2, 2005, Pages 309-318

  Wang, Jin ^a   He, Q Peter ^a   Qin, S Joc ^b   Bode, Christopher A ^a   Purdy, Matthew A ^a  

^a ADVANCED MICRO DEVICES   (United States)

^b The University of Texas at Austin   (United States)

Author keywords

Double exponentially weighted moving average (EWMA); EWMA; Internal model control (IMC); Measurement delay; Recursive least squares (RLS); Run to run (RtR) control; Shallow trench isolation (STI)

Indexed keywords

CONTROL SYSTEM ANALYSIS; ESTIMATION; ETCHING; LEAST SQUARES APPROXIMATIONS; MAGNETIC FILTERS; ONLINE SYSTEMS;

DOUBLE EXPONENTIALLY MOVING AVERAGE (EWMA); EWMA; INTERNAL MODEL CONTROL (IMC); MEASUREMENT DELAY; RECURSIVE LEAST SQUARES (RLS); RUN-TO-RUN (RTR) CONTROL; SHALLOW TRENCH ISOLATION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 19544388598     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2005.846819     Document Type: Conference Paper

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