Designing response surface model-based run-by-run controllers: a worst case approach

IEEE transactions on components, packaging and manufacturing technology. Part C. Manufacturing

Volumn 19, Issue 2, 1996, Pages 98-104

  Baras, John S ^a   Patel, Nital S ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; LEAST SQUARES APPROXIMATIONS; MATHEMATICAL MODELS; OPTIMIZATION; PERFORMANCE; RECURSIVE FUNCTIONS; SPURIOUS SIGNAL NOISE; STATISTICAL METHODS;

RECURSIVE LEAST SQUARES BASED CONTROLLER; RESPONSE SURFACE METHODOLOGY; RUN BY RUN CONTROL;

STATISTICAL PROCESS CONTROL;

EID: 0030123463     PISSN: 10834400     EISSN: None     Source Type: Journal    
DOI: 10.1109/3476.507145     Document Type: Article

References (14)

1. S. Leang C. J. Spanos Statistically based feedback control of photoresist application Proc. IEEE/SEMI Advanced Semicond. Manufact. Conf. 185 190 1991 583 4298 167407
2. P. K. Mozumder G. G. Barna Statistical feedback control of a plasma etch process IEEE Trans. Semicond. Manufact. 7 1 1 11 1994 66 7140 286826
3. S. Leang C. J. Spanos Application of feed-forward control to a lithography stepper Proc. IEEE/SEMI Int. Semicond. Manufact. Science Symp. 79 84 1992 659 5047 197641
4. G. J. Gaston A. J. Walton An integration of simulation and response surface methodology for the optimization of IC processes IEEE Trans. Semicond. Manufact. 7 1 22 33 1994 66 7140 286830
5. S. W. Butler J. A. Stefani Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry IEEE Trans. Semicond. Manufact. 7 2 193 201 1994 66 7141 286855
6. E. Fogel Y. F. Huang On the value of information in system identification-Bounded noise case Automatica 18 2 229 238 1982
7. F. C. Schweppe Recursive state estimation: Unknown but bounded errors and system inputs IEEE Trans. Automat. Contr. 13 1 22 28 1968
8. F. L. Chernous'ko Optimal guaranteed estimates of indeterminacies with the aid of ellipsoids Engineering Cybernetics 18 1 9 1980
9. K.-K. Lin C. J. Spanos Statistical equipment modeling for VLSI manufacturing: An application for LPCVD IEEE Trans. Semicond. Manufact. 3 4 216 229 1990 66 2255 61971
10. S. Pan M. T. Reilly E. Di Fabrizio Q. Leonard J. W. Taylor F. Cerrina An optization design method for chemically amplified resist process control IEEE Trans. Semicond. Manufact. 7 3 325 332 1994 66 7544 311336
11. J. A. Power B. Donnellan A. Mathewson W. A. Lane Relating statistical MOSFET model parameter variabilities to IC manufacturing process fluctuations enabling realistic worst case design IEEE Trans. Semicond. Manufact. 7 3 306 318 1994 66 7544 311334
12. G. E. P. Box N. R. Darper Empirical Model-Building and Response Surfaces 1987 Wiley New York
13. M. F. Cheung S. Yurkovich K. M. Passino An optimal volume ellipsoid algorithm for parameter set estimation Proc. 30th IEEE Conf. Decision Contr. 969 974 1991 607 6597 261468
14. J. R. Deller M. Nayeri S. F. Odeh Least-square identification with error bounds for real time signal processing and control Proc. IEEE 18 6 815 849 1993 5 6533 257681