Etching of crystalline Si in Cl2 atmosphere by means of an optical fiber tip

Applied Physics Letters

Volumn 79, Issue 2, 2001, Pages 159-161

  Wysocki, G ^b   Dai, S T ^a,b   Brandstetter, T ^b   Heitz, J ^b   Bauerle D ^b  

^a TSINGHUA UNIVERSITY   (China)

^b JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035832948     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1369415     Document Type: Article

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