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Applied Physics A: Materials Science and Processing

Volumn 67, Issue 4, 1998, Pages 403-405

Patterning of YBa2Cu3O7-δ films using a near-field optical configuration

(5) Pedarnig, J D a Gottlich H b Rossler R a Heckl, W M b Bauerle D a

a JOHANNES KEPLER UNIVERSITY LINZ (Austria)

b UNIVERSITY OF MUNICH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); ELECTRIC PROPERTIES; ETCHING; FILM GROWTH; HIGH TEMPERATURE SUPERCONDUCTORS; OPTICAL MICROSCOPY; OXIDE SUPERCONDUCTORS; OXYGEN; PULSED LASER APPLICATIONS; SUPERCONDUCTING TRANSITION TEMPERATURE; SUPERCONDUCTIVITY;

DIRECT WRITING; PATTERNING; PULSED LASER DEPOSITION; SCANNING NEAR FIELD OPTICAL MICROSCOPY; SEMICONDUCTOR LIKE RESISTIVITY;

SUPERCONDUCTING FILMS;

EID: 0032179706 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390050793 Document Type: Article

Times cited : (9)

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